Chemical mechanical polishing/planarization (CMP) slurries are abrasive materials, also called non-crystalline inorganic oxides, which are dispersed in water blended with other chemicals and used in CMP processes for semiconductors. CMP process is employed in semiconductor manufacturing, where surfaces of wafers are smoothed and leveled with the help of abrasive slurries. This process is critical for precise lithography patterning, and is utilized after every deposition-etch step.
The Chemical Polishing Slurry (CMP) market has developed for several decades, and currently the global market is still dominated by few manufacturers from United States and Japan. Cabot Microelectronics is the largest producer, occupies for over 33 percent market share in the world, with manufacturing factories in US, Japan and Taiwan. The second-tier players are Hitachi Chemical, Fujimi Incorporated, Fujifilm, Dow Electronic Materials and Air Products/Versum Materials. The top six players occupy for over 88% market share.
Global Chemical Polishing Slurry market size will increase to 1840 Million US$ by 2025, from 1230 Million US$ in 2018, at a CAGR of 6.0% during the forecast period. In this study, 2018 has been considered as the base year and 2019 to 2025 as the forecast period to estimate the market size for Chemical Polishing Slurry.
This report researches the worldwide Chemical Polishing Slurry market size (value, capacity, production and consumption) in key regions like United States, Europe, Asia Pacific (China, Japan) and other regions.
This study categorizes the global Chemical Polishing Slurry breakdown data by manufacturers, region, type and application, also analyzes the market status, market share, growth rate, future trends, market drivers, opportunities and challenges, risks and entry barriers, sales channels, distributors and Porter's Five Forces Analysis.
The following manufacturers are covered in this report:
Dow Electronic Materials
Air Products/Versum Materials
Chemical Polishing Slurry Breakdown Data by Type
Colloidal Silica Slurry
Chemical Polishing Slurry Breakdown Data by Application
Disk Drive Components
Other Microelectronic Surfaces
Chemical Polishing Slurry Production Breakdown Data by Region
Chemical Polishing Slurry Consumption Breakdown Data by Region
Rest of Europe
Central & South America
Rest of South America
Middle East & Africa
Rest of Middle East & Africa
The study objectives are:
To analyze and research the global Chemical Polishing Slurry capacity, production, value, consumption, status and forecast;
To focus on the key Chemical Polishing Slurry manufacturers and study the capacity, production, value, market share and development plans in next few years.
To focuses on the global key manufacturers, to define, describe and analyze the market competition landscape, SWOT analysis.
To define, describe and forecast the market by type, application and region.
To analyze the global and key regions market potential and advantage, opportunity and challenge, restraints and risks.
To identify significant trends and factors driving or inhibiting the market growth.
To analyze the opportunities in the market for stakeholders by identifying the high growth segments.
To strategically analyze each submarket with respect to individual growth trend and their contribution to the market.
To analyze competitive developments such as expansions, agreements, new product launches, and acquisitions in the market.
To strategically profile the key players and comprehensively analyze their growth strategies.
In this study, the years considered to estimate the market size of Chemical Polishing Slurry :
History Year: 2014-2018
Base Year: 2018
Estimated Year: 2019
Forecast Year 2019 to 2025
For the data information by region, company, type and application, 2018 is considered as the base year. Whenever data information was unavailable for the base year, the prior year has been considered.